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The first SiGe device to go into production was the HBT in 1999. The performance of a Si bipolar (BJT) can be enhanced by the addition of SiGe to the base region of the transistor. Two schemes exist to enhance performance, a rectangular Ge base profile (HBT) and a linearly graded base. The linear base provides a built in electric field which accelerates electrons across the base region. The band structure for the HBT and the linear grade transistors are shown on the right.
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The demonstrated cutoff frequencies (fT - the frequency where the gain for the transistor equals 1) for HBTs has now reached 360 GHz and this is predicted to increase as technology progresses. There is a downside to this, however, in that the breakdown voltage between the collector and the emitter also decreases as fT is increased.
Freddy R Vallenilla R
16.791.006
EES SEC 2
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